鋁電解電容器用陽極鋁箔電蝕時電化學舉動之研究

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黃建智(Jian-Zh Huang ) 查詢紙本館藏

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機械工程研究所

論文名稱

鋁電解電容器用陽極鋁箔電蝕時電化學舉動之研究

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摘要(中)

本篇論文研究的主題為探討鋁電解電容器用陽極鋁箔在電化學蝕刻時所產生之腐蝕反應，並藉由腐蝕反應的變化來觀察其對電蝕箔最終性能之影響。內容包含有高壓陽極箔之直流電蝕及低壓陽極箔之交流電蝕的研究。
實驗首先利用ICP-AES來分析高壓陽極箔及低壓陽極箔內所含之微量元素，確定其元素種類及含量，以便後續之研究。分別依照探討之主題來控制不同的電蝕參數，實際電蝕高壓陽極箔及低壓陽極箔，之後再按照EIAJ的規範對電蝕箔做化成處理，並量測其靜電容量與重量損失率。利用光學顯微鏡(OM)及掃描式電子顯微鏡(SEM)來觀察電蝕箔之截面腐蝕形態及表面的腐蝕孔洞分佈情形。藉由這些分析方法，來比較不同電蝕參數所造成之腐蝕組織對鋁電解電容器用陽極鋁箔之靜電容量的影響。
在電化學分析方面，藉由電化學分析儀(potentiostats /galvanostats for electrochemical research)來觀察不同電蝕條件下電位及電流變化之情形。藉由電位或電流的變化，可判斷在各種條件下，腐蝕反應進行的情形，再配合靜電容量及重量損失率之量測與腐蝕狀況之實際觀察，可對鋁電解電容器用陽極鋁箔之腐蝕舉動做最完整之探討。
由實驗結果得知：高壓陽極箔之前處理濃度愈高，在電蝕時形成之腐蝕孔洞會愈細密，而若在前處理溶液中添加微量元素，則可使得腐蝕孔洞明顯變大；在低壓電蝕方面，若電蝕頻率愈高，所形成之腐蝕孔洞愈小，而當溫度增加時，要達到最佳靜電容量之頻率也必須跟著升高。

摘要(英)

Electrochemical etching of high purity aluminum foils is widely used in the manufacture of electrolytic capacitor electrodes. In this paper, the electrochemical behavior of high purity aluminum foils in hydrochloric acid has been studied. Effects of etching factors could be observed by the research of electrochemical behavior. The contents of this paper included the DC-etching for high voltage aluminum foils and the AC-etching for low voltage aluminum foils.
The chemical compositions of high purity aluminum foils were determined before etching by using the analysis of ICP-AES. According to the selected parameters of electrochemical etching, the aluminum foils have been etched, and the capacitance was measured under EIAJ specifications. For surface and cross section morphology studies, the samples were examined in the SEM and OM, respectively. The methods of chrono-potentiometry and galvanostatic cyclic voltammetry were applied to obtain the voltage-time and voltage-current curves by using a potentiostats/galvanostats. From the observation of etched microstructure and the electrochemical analysis, the effect of etching factors on the etching behavior of high purity aluminum foils could be studied in detail.
In the results of experiments, it was found that the more concentrated pretreatment solution, the finer etched pits of high voltage aluminum foils. And the trace elements in pretreatment solution could coarsen the pits obviously. The size of etched pits fined with increasing frequency in AC-etching. When the temperature of etchant increased, the frequency that performed excellent capacitance must be raised.

關鍵字(中)

★ 陽極鋁箔
★ 電化學
★ 電容器
★ 電蝕

關鍵字(英)

論文目次

授權書 ..................................................Ⅰ
Abstract ................................................Ⅱ
摘要 ....................................................Ⅲ
目錄 ....................................................Ⅳ
表目錄 ..................................................Ⅵ
圖目錄 ..................................................Ⅶ
第一章緒論 ..............................................1
一、序言 .............................................1
二、理論基礎與論文回顧 ...............................3
2.1 電容器的基本構造與原理 .........................3
2.2 增加陽極鋁箔表面積的方法 .......................7
2.3 電蝕的機構與原理 ...............................8
2.3.1 直流電蝕 ...................................9
2.3.2 交流電蝕 ...................................9
2.4 鋁箔性質對電蝕工程之影響 ......................10
2.4.1 微量元素 ..................................11
2.4.2 織構 (Texture) ............................12
2.4.3 差排密度 (Dislocation Density) ............13
2.5 電蝕前處理之影響 ..............................13
2.6 電蝕溶液之影響 ................................14
2.6.1 氯離子在電蝕過程中的影響 ..................14
2.6.2 硫酸根離子在電蝕過程中的影響 ..............15
2.6.3 電蝕溶液之濃度控制 ........................16
2.6.4 電蝕溶液之溫度控制 ........................17
2.7 洗淨、後處理及乾燥的影響 ......................17
2.8 化成處理 ......................................18
第二章本文 .............................................19
一、前言 ............................................19
二、實驗步驟與方法 ..................................20
2.1 鋁箔成份分析 ..................................20
2.2 電化學蝕刻處理 ................................20
2.2.1 高壓直流電電蝕 ............................20
2.2.2 低壓交流電電蝕 ............................21
2.3 電蝕箔之化成處理 ..............................21
2.3.1 高壓化成 ..................................21
2.3.2 低壓化成 ..................................23
2.4 靜電容量的量測 ................................23
2.5 腐蝕組織之觀察 ................................24
2.5.1 腐蝕截面之觀察 ............................24
2.5.2 腐蝕表面之觀察 ............................24
2.6 電化學分析 ....................................24
三、結果與討論 ......................................26
3.1 鋁箔成份分析結果 ..............................26
3.2 高壓陽極用電蝕鋁箔的性質分析 ..................26
3.2.1 前處理濃度之影響 ..........................26
3.2.2 不同前處理溶液之影響 ......................29
3.3 低壓陽極用電蝕鋁箔的性質分析 ..................32
四、結論 ............................................37
五、參考文獻 ........................................39
表 ......................................................42
圖 ......................................................44

參考文獻

[1] 山口謙四郎, “電解コンデンサ用高純度アルミニウム箔”, 日本輕金屬雜誌, vol.35, no.11, pp.365-371, 1985.
[2] 永田伊佐也, “アルミニウム乾式電解コンデンサ(中譯)”, 日本蓄電器工業株式會社刊, 1985.
[3] R. S. Alwitt, H. Uchi, T. R. Beck and R. C. Alkire, “J. Electrochem. Soc.”, vol.131, no.1, pp.13-17, 1984.
[4] K. R. Hebert and R. C. Alkire,“This Journal”, Accepted for publication.
[5] Chirstopher K. Dyer and Robert S. Alwitt, “Surface Changes during A.C. Etching of Aluminum”, J. Electrochem. Soc., Vol. 128, No. 2, pp. 300-305, 1981.
[6] Eiichi SGANUMA, Yuji TANNO, Takeshi ITO, Akira FUNAKOSHI and Kenzo MATSUKI, “Surface Films Formed on Aluminum during AC Etching in Hydrochloric Acid Solution”, 表面技術, Vol. 41, No. 10, pp. 1049-1053, 1990.
[7] H. P. Hack, “Metals Handbook, vol.13, Corrosion 9th ed.”, ASM, Metals Park, OH, pp.234, 1987.
[8] 川島浪夫, 中村雄造, 西坂基,日本輕金屬雜誌, vol. 21, pp.54,1956.
[9] 川島浪夫, 中村雄造, 西坂基,日本輕金屬雜誌, vol. 5, pp.121,1952.
[10] P. C. M. de Haan, J. van Ri jkom and J. A. H. Sontgerath, “Materials Science Forum”, vols. 217-222, pp. 765-770, 1996.
[11] Nobuyoshi KANZAKI, “Current Situation and Issues of Surface Treatment for Aluminum Electrolytic Capacitor”, 表面技術, vol.48, no.10,pp.976-981,1997.
[12] Izaya NAGATA, “Aluminum foils for electrolytic capacitors from the stand point of capacitor manufacturers”, 日本輕金屬雜誌,vol.38,no.9,pp.552-557,1988.
[13] 特許公報; 昭51-34108, 昭38-21872 公開特許公報; 昭52-120364, 昭53-16857
[14] J. FLIS , L. KOWALCZYK, “Effect of sulphate anions on tunnel of aluminium”, J. Electrochem. Soc.：JOURNAL OF APPLIED ELECTROCHEMISTRY, 25 ,pp. 501-507, 1995.
[15] 柯賢文, 腐蝕及其防制, 1st, 全華科技圖書股份有限公司, chap 7, 1995.
[16] Kenzo MATSUKI, Akira FUNAKOSHI, Eiichi SUGANUMA, Takeshi ITO and Yuji TANNO, “Effects of Pretreatment of Aluminum on Alternating Current Etching in Hydrochloric Acid”, 金屬表面技術, Vol. 37, No. 11, pp. 655-659, 1986.
[17] Kurt Hebert and Richard Alkire, “Growth Rates of Aluminum Etch Tunnels”, J. Electrochem. Soc.：JOURNAL OF APPLIED ELECTROCHEMISTRY, pp. 2447-2452, October, 1998.
[18] J. L. Miles, P. H. Smith, J. Electrochem. Soc., Vol. 12, pp. 1240, 1963.
[19] G. J. Tibol, R. W. Hull, ibid., Vol. 111, No. 12, pp. 1368, 1964.
[20] W. LIN, G. C. TU, C. F. LIN and Y. M. PENG, “The Effect of Lead Impurity on the DC-Etching Behaviour of Aluminum Foil Electrolytic Capacitor Usage”, Corrosion Science, Vol. 38, No. 6, pp. 889-907, 1996.

指導教授

歐炳隆(Bin-Lung Ou)

審核日期

2001-6-26

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